Dynamic Flash Memory with fast block refresh feature using double storage gates and one select gate
This paper proposes a Dynamic Flash Memory (DFM) (Sakui and Harada, 2020; 2021 [1,2]) with double storage gates and one select gate based on FinFET and Surrounding Gate Transistor (SGT) (Takato et al., 1988 [3]) architectures. Like DRAM (Dennard, 1967 [4]), refresh is required, but fast block refres...
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Published in | Memories - Materials, Devices, Circuits and Systems Vol. 2; p. 100007 |
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Main Authors | , |
Format | Journal Article |
Language | English |
Published |
Elsevier Ltd
01.10.2022
Elsevier |
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Abstract | This paper proposes a Dynamic Flash Memory (DFM) (Sakui and Harada, 2020; 2021 [1,2]) with double storage gates and one select gate based on FinFET and Surrounding Gate Transistor (SGT) (Takato et al., 1988 [3]) architectures. Like DRAM (Dennard, 1967 [4]), refresh is required, but fast block refresh improves the duty ratio. Analogous to Flash (Masuoka, 1981 [5]), three basic operations of “0” Erase, “1” Program, and Read are necessary, but the ability to carry out Read-While-Erase (RWE), and Program-While-Erase (PWE) operations in the background results in a faster system. |
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AbstractList | This paper proposes a Dynamic Flash Memory (DFM) (Sakui and Harada, 2020; 2021 [1,2]) with double storage gates and one select gate based on FinFET and Surrounding Gate Transistor (SGT) (Takato et al., 1988 [3]) architectures. Like DRAM (Dennard, 1967 [4]), refresh is required, but fast block refresh improves the duty ratio. Analogous to Flash (Masuoka, 1981 [5]), three basic operations of “0” Erase, “1” Program, and Read are necessary, but the ability to carry out Read-While-Erase (RWE), and Program-While-Erase (PWE) operations in the background results in a faster system. |
ArticleNumber | 100007 |
Author | Harada, Nozomu Sakui, Koji |
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Cites_doi | 10.1109/IEDM.1988.32796 10.1109/ESSDERC.2011.6044197 10.1109/IMW51353.2021.9439614 10.1109/CICC.2002.1012775 10.1109/IMW51353.2021.9439625 10.7567/SSDM.2022.F-4-02 |
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Keywords | Z-RAM GAA FinFET Surrounding Gate Transistor (SGT) SOI Capacitorless DRAM Floating Body |
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References | Sakui (b8) 1989 H. Takato, et al., High Performance CMOS Surrounding Gate Transistor (SGT) for Ultra High Density LSIs, in: Proc. IEDM, 1988, pp. 222–225. H. Chung, et al., Novel 4F Y. Li, et al., 1.5-nm Node Surrounding Gate Transistor (SGT)-SRAM Cell with Staggered Pillar and Self-Aligned Process for Gate, Bottom Contact, and Pillar, in: Proc. IEEE IMW, 2021, pp. 99–102. Kim (b13) 2019 Ohsawa (b10) 2002; 37 Ohsawa (b11) 2006; 75 Dennard (b4) 1967 Masuoka (b5) 1981 P.C. Fazan, et al., A simple 1-transistor capacitorless memory cell for high performance embedded DRAMs, in: Proc. IEEE CICC, 2002, pp. 99–102. Sakui, Harada (b15) 2021 K. Sakui, N. Harada, Dynamic Flash Memory with Dual Gate Surrounding Gate Transistor (SGT), in: Proc. IEEE IMW, 2021, pp. 72–75. DRAM Cell with Vertical Pillar Transistor(VPT), in: Proc. ESSDRC, 2011, pp. 211–214. K. Sakui, N. Harada, Perfect Read Non-Destructive Dynamic Flash Memory (DFM), in: The 16th Annual Flash Memory Summit, OMEM-301-2, 2022, (to be presented). D.S. Woo, DRAM: Its Challenging History and Future, in: The Proc. 2018 IEDM Short Course 2, 2018, pp. 3–57. Sakui, Harada (b1) 2020 Sakui (10.1016/j.memori.2022.100007_b8) 1989 Ohsawa (10.1016/j.memori.2022.100007_b10) 2002; 37 Kim (10.1016/j.memori.2022.100007_b13) 2019 Masuoka (10.1016/j.memori.2022.100007_b5) 1981 Ohsawa (10.1016/j.memori.2022.100007_b11) 2006; 75 Sakui (10.1016/j.memori.2022.100007_b15) 2021 10.1016/j.memori.2022.100007_b12 Dennard (10.1016/j.memori.2022.100007_b4) 1967 10.1016/j.memori.2022.100007_b3 10.1016/j.memori.2022.100007_b14 10.1016/j.memori.2022.100007_b2 Sakui (10.1016/j.memori.2022.100007_b1) 2020 10.1016/j.memori.2022.100007_b9 10.1016/j.memori.2022.100007_b7 10.1016/j.memori.2022.100007_b6 |
References_xml | – year: 1981 ident: b5 article-title: Semiconductor memory device publication-title: U.S.P. 4, 437, 174 contributor: fullname: Masuoka – year: 1989 ident: b8 article-title: Semiconductor storage device publication-title: Japanese Patent Application Number: 01-311386, Publication Number: 03-171768 contributor: fullname: Sakui – start-page: 198 year: 2019 end-page: 199 ident: b13 article-title: 12-EUV layer surrounding gate transistor (SGT) for vertical 6-T SRAM: 5-nm-class technology for ultra-density logic devices publication-title: VLSI Technology contributor: fullname: Kim – year: 2020 ident: b1 article-title: Memory device with semiconductor device publication-title: Japanese Patent Number: 7057032 contributor: fullname: Harada – year: 1967 ident: b4 article-title: Field-effect transistor memory publication-title: U.S.P. 3, 387, 286 contributor: fullname: Dennard – volume: 75 start-page: 1131 year: 2006 end-page: 1135 ident: b11 article-title: SOI DRAM with one-transistor FET cell publication-title: Oyo Buturi contributor: fullname: Ohsawa – volume: 37 start-page: 1510 year: 2002 end-page: 1522 ident: b10 article-title: Memory design using a one-transistor gain cell on SOI publication-title: IEEE JSSC contributor: fullname: Ohsawa – start-page: 127 year: 2021 end-page: 128 ident: b15 article-title: Dynamic flash memory with dual gate surrounding gate transistor (SGT) for computation in memory publication-title: SSDM contributor: fullname: Harada – ident: 10.1016/j.memori.2022.100007_b7 – year: 1981 ident: 10.1016/j.memori.2022.100007_b5 article-title: Semiconductor memory device contributor: fullname: Masuoka – ident: 10.1016/j.memori.2022.100007_b3 doi: 10.1109/IEDM.1988.32796 – ident: 10.1016/j.memori.2022.100007_b6 doi: 10.1109/ESSDERC.2011.6044197 – year: 1989 ident: 10.1016/j.memori.2022.100007_b8 article-title: Semiconductor storage device contributor: fullname: Sakui – start-page: 127 year: 2021 ident: 10.1016/j.memori.2022.100007_b15 article-title: Dynamic flash memory with dual gate surrounding gate transistor (SGT) for computation in memory contributor: fullname: Sakui – ident: 10.1016/j.memori.2022.100007_b2 doi: 10.1109/IMW51353.2021.9439614 – ident: 10.1016/j.memori.2022.100007_b9 doi: 10.1109/CICC.2002.1012775 – year: 1967 ident: 10.1016/j.memori.2022.100007_b4 article-title: Field-effect transistor memory contributor: fullname: Dennard – ident: 10.1016/j.memori.2022.100007_b14 doi: 10.1109/IMW51353.2021.9439625 – year: 2020 ident: 10.1016/j.memori.2022.100007_b1 article-title: Memory device with semiconductor device contributor: fullname: Sakui – volume: 37 start-page: 1510 issue: 11 year: 2002 ident: 10.1016/j.memori.2022.100007_b10 article-title: Memory design using a one-transistor gain cell on SOI publication-title: IEEE JSSC contributor: fullname: Ohsawa – start-page: 198 year: 2019 ident: 10.1016/j.memori.2022.100007_b13 article-title: 12-EUV layer surrounding gate transistor (SGT) for vertical 6-T SRAM: 5-nm-class technology for ultra-density logic devices contributor: fullname: Kim – volume: 75 start-page: 1131 issue: 9 year: 2006 ident: 10.1016/j.memori.2022.100007_b11 article-title: SOI DRAM with one-transistor FET cell publication-title: Oyo Buturi contributor: fullname: Ohsawa – ident: 10.1016/j.memori.2022.100007_b12 doi: 10.7567/SSDM.2022.F-4-02 |
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Title | Dynamic Flash Memory with fast block refresh feature using double storage gates and one select gate |
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