Removing imperceptible fluoride residue after chemical dry-cleaning to fabricate uniform low-resistance NiSi film

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Bibliographic Details
Published inJournal of vacuum science and technology. B, Nanotechnology & microelectronics Vol. 29; no. 5; p. 51203
Main Authors Futase, Takuya, Tanioto, Hisanori, Kimoto, Mitsuo, Tsugane, Hideaki, Suzuki, Hidenori, Tobimatsu, Hiroshi
Format Journal Article
LanguageEnglish
Japanese
Published 01.09.2011
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ISSN:2166-2746
2166-2754
DOI:10.1116/1.3622301