Pulsed helium ion beam induced deposition: A means to high growth rates

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Bibliographic Details
Published inJournal of vacuum science and technology. B, Nanotechnology & microelectronics Vol. 29; no. 6; p. 6
Main Authors Alkemade, Paul F. A., Miro, Hozanna, van Veldhoven, Emile, Maas, Diederik J., Smith, Daryl A., Rack, Philip D.
Format Journal Article
LanguageEnglish
Japanese
Published 01.11.2011
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ISSN:2166-2746
2166-2754
DOI:10.1116/1.3656347