Chemical Vapor Deposition of AlZrN Coatings by the Reaction of In Situ Produced ZrCl4 and AlCl3 with NH3
Ternary transition metal nitrides are commonly used as protective coatings on cutting tools, owing to their excellent mechanical and wear properties. While AlTiN is a very well-studied material, little is known about AlZrN, in part due to the large miscibility gap in the phase diagram of AlN-ZrN. In...
Saved in:
Published in | Key engineering materials Vol. 809; pp. 427 - 432 |
---|---|
Main Authors | , , , |
Format | Journal Article |
Language | English |
Published |
Zurich
Trans Tech Publications Ltd
01.06.2019
|
Subjects | |
Online Access | Get full text |
Cover
Loading…
Summary: | Ternary transition metal nitrides are commonly used as protective coatings on cutting tools, owing to their excellent mechanical and wear properties. While AlTiN is a very well-studied material, little is known about AlZrN, in part due to the large miscibility gap in the phase diagram of AlN-ZrN. In this study, AlZrN thin films were prepared using chemical vapor deposition. By the reaction of metallic aluminum and zirconium with HCl gas under elevated temperature, AlCl3 and ZrCl4 were produced in situ and subsequently transported into a heated coating reactor with a carrier gas. Due to the high temperatures and the separately introduced mixture of NH3 and N2, AlZrN coatings were deposited. By varying the experimental conditions, such as the ratio between ZrCl4 and AlCl3, we studied the influence of these parameters on the coating thickness and morphology as well as the microstructure. Additionally, the impact of different sample positions in the coating reactor on the deposited coatings was investigated. Furthermore, the generated samples were characterized by scanning electron microscopy, energy dispersive x-ray spectroscopy and transmission electron microscopy. |
---|---|
Bibliography: | Selected, peer reviewed papers from the “22nd Symposium on Composites”, June 26-28, 2019, Kaiserslautern, Germany |
ISSN: | 1013-9826 1662-9795 1662-9795 |
DOI: | 10.4028/www.scientific.net/KEM.809.427 |