A sensitive positive resist for 0.1-.MU.m electron-beam direct-writing lithography
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Published in | Journal of photopolymer science and technology Vol. 10; no. 4; pp. 625 - 628 |
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Main Authors | , , , , |
Format | Journal Article |
Language | English |
Published |
1997
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Online Access | Get full text |
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ISSN: | 0914-9244 1349-6336 |
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DOI: | 10.2494/photopolymer.10.625 |