Resist Characteristics of Acryl Polymer with Methyl Acetal Protecting Group for 193nm Lithography

Saved in:
Bibliographic Details
Published inJournal of photopolymer science and technology Vol. 18; no. 3; pp. 393 - 398
Main Authors Shirai, Masamitsu, Matsumaru, Shogo, Takahashi, Ryusaku, Kasai, Kohei, Kinoshita, Yohei, Hada, Hideo
Format Journal Article
LanguageEnglish
Published 2005
Online AccessGet full text

Cover

More Information
ISSN:0914-9244
1349-6336
DOI:10.2494/photopolymer.18.393