Disturbless flash memory due to high boost efficiency on BiCS structure and optimal memory film stack for ultra high density storage device

Program and erase operation on NAND-string of Bit-Cost Scalable (BiCS) flash memory has been successfully achieved. High boost efficiency of floating pillars and ONON (block oxide/charge SiN/tunnel oxide/tunnel SiN) structure as a memory film stack improve disturbance characteristics enough to reali...

Full description

Saved in:
Bibliographic Details
Published in2008 IEEE International Electron Devices Meeting pp. 1 - 4
Main Authors Komori, Y., Kido, M., Kito, M., Katsumata, R., Fukuzumi, Y., Tanaka, H., Nagata, Y., Ishiduki, M., Aochi, H., Nitayama, A.
Format Conference Proceeding
LanguageEnglish
Published IEEE 01.12.2008
Subjects
Online AccessGet full text

Cover

Loading…
Abstract Program and erase operation on NAND-string of Bit-Cost Scalable (BiCS) flash memory has been successfully achieved. High boost efficiency of floating pillars and ONON (block oxide/charge SiN/tunnel oxide/tunnel SiN) structure as a memory film stack improve disturbance characteristics enough to realize tera-bit density of three dimensional flash memory. BiCS flash memory has become a more promising candidate for ultra high density memory.
AbstractList Program and erase operation on NAND-string of Bit-Cost Scalable (BiCS) flash memory has been successfully achieved. High boost efficiency of floating pillars and ONON (block oxide/charge SiN/tunnel oxide/tunnel SiN) structure as a memory film stack improve disturbance characteristics enough to realize tera-bit density of three dimensional flash memory. BiCS flash memory has become a more promising candidate for ultra high density memory.
Author Nagata, Y.
Ishiduki, M.
Katsumata, R.
Kido, M.
Tanaka, H.
Kito, M.
Nitayama, A.
Komori, Y.
Fukuzumi, Y.
Aochi, H.
Author_xml – sequence: 1
  givenname: Y.
  surname: Komori
  fullname: Komori, Y.
  organization: Center for Semicond. R&D, Toshiba Corp., Yokohama
– sequence: 2
  givenname: M.
  surname: Kido
  fullname: Kido, M.
  organization: Center for Semicond. R&D, Toshiba Corp., Yokohama
– sequence: 3
  givenname: M.
  surname: Kito
  fullname: Kito, M.
  organization: Center for Semicond. R&D, Toshiba Corp., Yokohama
– sequence: 4
  givenname: R.
  surname: Katsumata
  fullname: Katsumata, R.
  organization: Center for Semicond. R&D, Toshiba Corp., Yokohama
– sequence: 5
  givenname: Y.
  surname: Fukuzumi
  fullname: Fukuzumi, Y.
  organization: Center for Semicond. R&D, Toshiba Corp., Yokohama
– sequence: 6
  givenname: H.
  surname: Tanaka
  fullname: Tanaka, H.
  organization: Center for Semicond. R&D, Toshiba Corp., Yokohama
– sequence: 7
  givenname: Y.
  surname: Nagata
  fullname: Nagata, Y.
  organization: Toshiba Inf. Syst. (Japan) Corp., Yokohama
– sequence: 8
  givenname: M.
  surname: Ishiduki
  fullname: Ishiduki, M.
  organization: Center for Semicond. R&D, Toshiba Corp., Yokohama
– sequence: 9
  givenname: H.
  surname: Aochi
  fullname: Aochi, H.
  organization: Center for Semicond. R&D, Toshiba Corp., Yokohama
– sequence: 10
  givenname: A.
  surname: Nitayama
  fullname: Nitayama, A.
  organization: Center for Semicond. R&D, Toshiba Corp., Yokohama
BookMark eNpVkE1OwzAQhQ0Uibb0AIiNL5BiO_5JltAWqFTEApDYVU4ybg1JXNkOUs7ApYlUWLCaN3pvPo3eBI1a1wJCV5TMKSX5zXq1fJozQrI5V7nMUnqCZrnKKGecs3QQp2jMqJAJoer97J-n-AiNCZVpQnOaXaBJCB-EMCVyMUbfSxti54saQsCm1mGPG2ic73HVAY4O7-1ujwvnQsRgjC0ttGWPXYvv7OIFh-i7crgHrNsKu0O0ja7_CMbWzZDQ5Sc2zuOujl4feRW0wcZ-MJ3XOxj2L1vCJTo3ug4w-51T9Ha_el08Jpvnh_XidpOUjPCYaFmAoaYwEhgRmQaRK2EUFUpmknCgvBQFkVQUnBuiJSsMBVEpoRlPDc_SKbo-ci0AbA9--Nn3299e0x_nfWva
CitedBy_id crossref_primary_10_1063_5_0161000
crossref_primary_10_1109_TED_2011_2107557
crossref_primary_10_1109_TED_2009_2030712
crossref_primary_10_7567_JJAP_57_04FP06
crossref_primary_10_7567_JJAP_53_024201
crossref_primary_10_1109_JEDS_2022_3142046
crossref_primary_10_1109_MSSC_2020_3021841
crossref_primary_10_35848_1347_4065_acb57e
crossref_primary_10_1109_ACCESS_2022_3160271
crossref_primary_10_1109_LED_2011_2118734
crossref_primary_10_1109_TED_2011_2160642
crossref_primary_10_3390_app122110697
ContentType Conference Proceeding
DBID 6IE
6IH
CBEJK
RIE
RIO
DOI 10.1109/IEDM.2008.4796831
DatabaseName IEEE Electronic Library (IEL) Conference Proceedings
IEEE Proceedings Order Plan (POP) 1998-present by volume
IEEE Xplore All Conference Proceedings
IEEE Electronic Library Online
IEEE Proceedings Order Plans (POP) 1998-present
DatabaseTitleList
Database_xml – sequence: 1
  dbid: RIE
  name: IEEE Electronic Library Online
  url: https://proxy.k.utb.cz/login?url=https://ieeexplore.ieee.org/
  sourceTypes: Publisher
DeliveryMethod fulltext_linktorsrc
Discipline Engineering
EISBN 9781424423781
1424423783
EISSN 2156-017X
EndPage 4
ExternalDocumentID 4796831
Genre orig-research
GroupedDBID 29Q
6IE
6IF
6IH
6IK
6IL
6IM
6IN
AAJGR
ABLEC
ACGFS
ADZIZ
ALMA_UNASSIGNED_HOLDINGS
BEFXN
BFFAM
BGNUA
BKEBE
BPEOZ
CBEJK
CHZPO
IEGSK
IJVOP
IPLJI
JC5
M43
OCL
RIE
RIG
RIL
RIO
RNS
ID FETCH-LOGICAL-c204t-a6bef1fbf6e2058ae5975f715768604e14c5b0615b44f0a62bf1e5d75a243f483
IEDL.DBID RIE
ISBN 9781424423774
1424423775
ISSN 0163-1918
IngestDate Wed Jun 26 19:22:14 EDT 2024
IsPeerReviewed false
IsScholarly false
Language English
LinkModel DirectLink
MergedId FETCHMERGED-LOGICAL-c204t-a6bef1fbf6e2058ae5975f715768604e14c5b0615b44f0a62bf1e5d75a243f483
PageCount 4
ParticipantIDs ieee_primary_4796831
PublicationCentury 2000
PublicationDate 2008-12
PublicationDateYYYYMMDD 2008-12-01
PublicationDate_xml – month: 12
  year: 2008
  text: 2008-12
PublicationDecade 2000
PublicationTitle 2008 IEEE International Electron Devices Meeting
PublicationTitleAbbrev IEDM
PublicationYear 2008
Publisher IEEE
Publisher_xml – name: IEEE
SSID ssj0027595
ssj0000453268
Score 1.5929209
Snippet Program and erase operation on NAND-string of Bit-Cost Scalable (BiCS) flash memory has been successfully achieved. High boost efficiency of floating pillars...
SourceID ieee
SourceType Publisher
StartPage 1
SubjectTerms Costs
Electronic mail
FETs
Flash memory
Information systems
Semiconductor films
Silicon compounds
Stress control
Substrates
Testing
Title Disturbless flash memory due to high boost efficiency on BiCS structure and optimal memory film stack for ultra high density storage device
URI https://ieeexplore.ieee.org/document/4796831
hasFullText 1
inHoldings 1
isFullTextHit
isPrint
link http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwjV3LToQwFG3UlW58x3fuwqWMpQ9gtr6iJmNM1MSdacttNM6AGWGhv-BPewvM-IgLd5SQAoXce257zilj-5Y76XQWFMt9ESkh8siIXEWUepWTwqDUQY08uErO79Tlvb6fYQdTLQwiNuQz7IXDZi0_L10dpsoOVdpPsiCans24aLVa0_kUgiaERLKvYkv3W_piIiOqSbKJqEvINNUTr6eurbrlzpj3Dy9OTwYtxbK7249tV5qsc7bIBpPnbckmz726sj33_svK8b8vtMTWvvR9cD3NXMtsBosVtvDNmnCVfZzQ96_HdkiREDxB7EcYBVLuG-Q1QlVC8DkGguivFWBjQxE0nFAWcPR0fAOtLW09RjBFDiXFpZEZTnrwT8MRXWHcMxBkhnpYjU3bXx7o9NUbBMomBTpqh0C2xu7OTm-Pz6Nu44bICa6qyCQWfeytT1BwnRmkqkX7NA61TcIVxsppG7CUVcpzkwjrY9R5qo1Q0qtMrrO5oixwg0HqnbEyRmkTyreZNDzstCWt49JTT2qTrYZhfXhpvTkeuhHd-vv0Nptv-B4NHWWHzdFY4C6BisruNX_TJ4V-xiU
link.rule.ids 310,311,786,790,795,796,802,27958,55109
linkProvider IEEE
linkToHtml http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwjV1LT9tAEF5FcCi98AoqtKVz6LEO9j5s51oSFApBlSASt2h3PSsQiY2CfaB_gT_NrO0kpeLQm9eyxvZoNY_d7_uWse8mtMKq1DOW-zyQnGeB5pkMKPVKK7hGoTwbeXwVjyby16267bAfKy4MItbgM-z5y3ovPyts5ZfKTmTSj1NPmt6kPB_2G7bWakWFihOqRdJ1u6X6DYAxFgF1JemS1sVFkqil2lM7lu2GJ1k9OR8Oxg3Isn3fm4NX6rxzts3Gyy9u4CYPvao0PfvnHzHH__2lHdZdM_zg9yp37bIO5nvs41_ihPvsZUAzoFqYGcVCcFRk38Hcw3KfIasQygK80jFQkf5UAtZCFJ7FCUUOP-9Pr6ERpq0WCDrPoKDINNezpQV3P5vTE9o-ABXNUM3KhW7sZR5QXz6DB21SqKOxD2VdNjkb3pyOgvbohsDyUJaBjg26yBkXIw9VqpH6FuWSyHc3cSgxklYZX00ZKV2oY25chCpLlOZSOJmKA7aRFzl-YpA4q42IUJiYMm4qdOjP2hLGhsKRJXnI9r1bp4-NOse09ejR-7e_sQ-jm_Hl9PL86uIz26rRHzU45QvbIL_gVyoxSnNcz6xXKibJew
openUrl ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fsummon.serialssolutions.com&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Abook&rft.genre=proceeding&rft.title=2008+IEEE+International+Electron+Devices+Meeting&rft.atitle=Disturbless+flash+memory+due+to+high+boost+efficiency+on+BiCS+structure+and+optimal+memory+film+stack+for+ultra+high+density+storage+device&rft.au=Komori%2C+Y.&rft.au=Kido%2C+M.&rft.au=Kito%2C+M.&rft.au=Katsumata%2C+R.&rft.date=2008-12-01&rft.pub=IEEE&rft.isbn=9781424423774&rft.issn=0163-1918&rft.eissn=2156-017X&rft.spage=1&rft.epage=4&rft_id=info:doi/10.1109%2FIEDM.2008.4796831&rft.externalDocID=4796831
thumbnail_l http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/lc.gif&issn=0163-1918&client=summon
thumbnail_m http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/mc.gif&issn=0163-1918&client=summon
thumbnail_s http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/sc.gif&issn=0163-1918&client=summon