Balancing of hemispherical resonator gyros by chemical etching
A procedure for balancing the four lower harmonics of the mass distribution defect in a fused quartz hemispherical toothless resonator of a hemispherical resonator gyroscope is considered. Chemical etching of unbalanced mass from the surface of a partially immersed resonator is done in accordance wi...
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Published in | Gyroscopy and navigation (Online) Vol. 6; no. 3; pp. 218 - 223 |
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Main Authors | , , , |
Format | Journal Article |
Language | English |
Published |
Moscow
Pleiades Publishing
05.07.2015
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Subjects | |
Online Access | Get full text |
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Summary: | A procedure for balancing the four lower harmonics of the mass distribution defect in a fused quartz hemispherical toothless resonator of a hemispherical resonator gyroscope is considered. Chemical etching of unbalanced mass from the surface of a partially immersed resonator is done in accordance with analytically calculated angle of the resonator rotation about the axis of symmetry, inclination and depth of the resonator immersion into a chemical bath, and the time of chemical etching. It is shown that the proposed method significantly reduces the balancing time and labor input as compared with ion plasma etching. |
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ISSN: | 2075-1087 2075-1109 |
DOI: | 10.1134/S2075108715030025 |