A Self-Limited Atomic Layer Deposition of WS 2 Based on the Chemisorption and Reduction of Bis( t -butylimino)bis(dimethylamino) Complexes

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Bibliographic Details
Published inChemistry of materials Vol. 31; no. 6; pp. 1881 - 1890
Main Authors Wu, Yanlin, Raza, Muhammad Hamid, Chen, Yen-Chun, Amsalem, Patrick, Wahl, Sebastian, Skrodczky, Kai, Xu, Xiaomin, Lokare, Kapil Shyam, Zhukush, Medet, Gaval, Pooja, Koch, Norbert, Quadrelli, Elsje Alessandra, Pinna, Nicola
Format Journal Article
LanguageEnglish
Published American Chemical Society 26.03.2019
Subjects
Chemical Sciences
Material chemistry
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ISSN:0897-4756
1520-5002
DOI:10.1021/acs.chemmater.8b03921