Zinc Oxide: From Precursor Chemistry to Gas Sensors: Plasma‐Enhanced Atomic Layer Deposition Process Engineering for Zinc Oxide Layers from a Nonpyrophoric Zinc Precursor for Gas Barrier and Sensor Applications (Small 22/2020)

In article number 1907506, Anjana Devi and co‐workers introduce a new, nonpyrophoric zinc precursor for plasma enhanced atomic layer deposition (PEALD) of zinc oxide (ZnO). Here, oxygen plasma is used to react with adsorbed zinc precursor on chemiresistor structures to form highly pure ZnO which is...

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Bibliographic Details
Published inSmall (Weinheim an der Bergstrasse, Germany) Vol. 16; no. 22
Main Authors Mai, Lukas, Mitschker, Felix, Bock, Claudia, Niesen, Alessia, Ciftyurek, Engin, Rogalla, Detlef, Mickler, Johannes, Erig, Matthias, Li, Zheshen, Awakowicz, Peter, Schierbaum, Klaus, Devi, Anjana
Format Journal Article
LanguageEnglish
Published Weinheim Wiley Subscription Services, Inc 01.06.2020
Subjects
atomic layer deposition
Atomic layer epitaxy
gas barrier layers
Gas sensors
Nanotechnology
Nitrogen dioxide
Oxygen plasma
Photovoltaic cells
Precursors
Zinc oxide
Zinc oxides
zinc precursors
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Summary:In article number 1907506, Anjana Devi and co‐workers introduce a new, nonpyrophoric zinc precursor for plasma enhanced atomic layer deposition (PEALD) of zinc oxide (ZnO). Here, oxygen plasma is used to react with adsorbed zinc precursor on chemiresistor structures to form highly pure ZnO which is used effectively as a selective gas sensing layer for NO2 in a functional gas sensor device.
ISSN:1613-6810
1613-6829
DOI:10.1002/smll.202070122