Prospective Wavelengths for Projection Lithography Using Synchrotron Radiation

Promising wavelengths for next-generation lithography with a wavelength shorter than 13.5 nm based on a synchrotron X-ray source are discussed. Theoretical and experimental values of the reflection coefficients of multilayer X-ray mirrors providing the maximum reflectivity in the range of 11.4–3.1 n...

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Published inTechnical physics Vol. 69; no. 4; pp. 818 - 823
Main Authors Chkhalo, N. I., Polkovnikov, V. N., Salashchenko, N. N., Shaposhnikov, R. A.
Format Journal Article
LanguageEnglish
Published Moscow Pleiades Publishing 2024
Springer Nature B.V
Subjects
Classical and Continuum Physics
Lithography
Multilayers
Physics
Physics and Astronomy
Synchrotron radiation
Wavelengths
X ray mirrors
X ray reflection
X ray sources
X-ray lithography
multilayer X-ray optics
multilayer X-ray mirrors
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Abstract Promising wavelengths for next-generation lithography with a wavelength shorter than 13.5 nm based on a synchrotron X-ray source are discussed. Theoretical and experimental values of the reflection coefficients of multilayer X-ray mirrors providing the maximum reflectivity in the range of 11.4–3.1 nm are presented. The theoretical efficiency of multilayer optics is compared for different wavelengths.
AbstractList Promising wavelengths for next-generation lithography with a wavelength shorter than 13.5 nm based on a synchrotron X-ray source are discussed. Theoretical and experimental values of the reflection coefficients of multilayer X-ray mirrors providing the maximum reflectivity in the range of 11.4–3.1 nm are presented. The theoretical efficiency of multilayer optics is compared for different wavelengths.
Author Salashchenko, N. N.
Polkovnikov, V. N.
Chkhalo, N. I.
Shaposhnikov, R. A.
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Copyright Pleiades Publishing, Ltd. 2024. ISSN 1063-7842, Technical Physics, 2024, Vol. 69, No. 4, pp. 818–823. © Pleiades Publishing, Ltd., 2024. Russian Text © The Author(s), 2022, published in Zhurnal Tekhnicheskoi Fiziki, 2022, Vol. 92, No. 8, pp. 1207–1212. English Text © Ioffe Institute, 2022.
Copyright_xml – notice: Pleiades Publishing, Ltd. 2024. ISSN 1063-7842, Technical Physics, 2024, Vol. 69, No. 4, pp. 818–823. © Pleiades Publishing, Ltd., 2024. Russian Text © The Author(s), 2022, published in Zhurnal Tekhnicheskoi Fiziki, 2022, Vol. 92, No. 8, pp. 1207–1212. English Text © Ioffe Institute, 2022.
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multilayer X-ray optics
multilayer X-ray mirrors
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Snippet Promising wavelengths for next-generation lithography with a wavelength shorter than 13.5 nm based on a synchrotron X-ray source are discussed. Theoretical and...
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SubjectTerms Classical and Continuum Physics
Lithography
Multilayers
Physics
Physics and Astronomy
Synchrotron radiation
Wavelengths
X ray mirrors
X ray reflection
X ray sources
Title Prospective Wavelengths for Projection Lithography Using Synchrotron Radiation
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