Prospective Wavelengths for Projection Lithography Using Synchrotron Radiation

Promising wavelengths for next-generation lithography with a wavelength shorter than 13.5 nm based on a synchrotron X-ray source are discussed. Theoretical and experimental values of the reflection coefficients of multilayer X-ray mirrors providing the maximum reflectivity in the range of 11.4–3.1 n...

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Bibliographic Details
Published inTechnical physics Vol. 69; no. 4; pp. 818 - 823
Main Authors Chkhalo, N. I., Polkovnikov, V. N., Salashchenko, N. N., Shaposhnikov, R. A.
Format Journal Article
LanguageEnglish
Published Moscow Pleiades Publishing 2024
Springer Nature B.V
Subjects
Classical and Continuum Physics
Lithography
Multilayers
Physics
Physics and Astronomy
Synchrotron radiation
Wavelengths
X ray mirrors
X ray reflection
X ray sources
X-ray lithography
multilayer X-ray optics
multilayer X-ray mirrors
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Summary:Promising wavelengths for next-generation lithography with a wavelength shorter than 13.5 nm based on a synchrotron X-ray source are discussed. Theoretical and experimental values of the reflection coefficients of multilayer X-ray mirrors providing the maximum reflectivity in the range of 11.4–3.1 nm are presented. The theoretical efficiency of multilayer optics is compared for different wavelengths.
ISSN:1063-7842
1090-6525
DOI:10.1134/S1063784224030058