Influence of magnetic layer thickness on [Fe80Ni20-O/SiO2]n multilayer thin films

In the present work, a series of [FesoNi20-O/SiO2]n multilayer thin films is fabricated using a reactive magnetron sputtering equipment. The thickness of SiO2 interlayer is fixed at 3 nm, while the thickness values of FesoNi20-O magnetic films range from 10 nm to 30 nm. All films present obvious in-...

Full description

Saved in:
Bibliographic Details
Published inChinese physics B Vol. 23; no. 8; pp. 99 - 102
Main Authors Wei, Jian-Qing, Geng, Hao, Xu, Lei, Wang, Lai-Sen, Chen, Yuan-Zhi, Yue, Guang-Hui, Peng, Dong-Liang
Format Journal Article
LanguageEnglish
Published 01.08.2014
Subjects
二氧化硅
厚度
多层薄膜
溅射设备
磁各向异性
磁性层
软磁特性
饱和磁化强度
Online AccessGet full text

Cover

More Information
Summary:In the present work, a series of [FesoNi20-O/SiO2]n multilayer thin films is fabricated using a reactive magnetron sputtering equipment. The thickness of SiO2 interlayer is fixed at 3 nm, while the thickness values of FesoNi20-O magnetic films range from 10 nm to 30 nm. All films present obvious in-plane uniaxial magnetic anisotropy. With increasing the FesoNi20-O layer thickness, the saturation magnetization increases slightly and the coercivity becomes larger due to the enlarged grain size, which could weaken the soft magnetic property. The results of high frequency magnetic permeability characterization show that films with thin magnetic layer are more suitable for practical applications. When the thickness of FesoNi20-O layer is 10 nm, the multilayer film exhibits the most comprehensive high-frequency magnetic property with a real permeability of 300 in gigahertz range.
Bibliography:magnetron sputtering, multilayer films, soft magnetic property, high frequency permeability
In the present work, a series of [FesoNi20-O/SiO2]n multilayer thin films is fabricated using a reactive magnetron sputtering equipment. The thickness of SiO2 interlayer is fixed at 3 nm, while the thickness values of FesoNi20-O magnetic films range from 10 nm to 30 nm. All films present obvious in-plane uniaxial magnetic anisotropy. With increasing the FesoNi20-O layer thickness, the saturation magnetization increases slightly and the coercivity becomes larger due to the enlarged grain size, which could weaken the soft magnetic property. The results of high frequency magnetic permeability characterization show that films with thin magnetic layer are more suitable for practical applications. When the thickness of FesoNi20-O layer is 10 nm, the multilayer film exhibits the most comprehensive high-frequency magnetic property with a real permeability of 300 in gigahertz range.
11-5639/O4
ISSN:1674-1056
2058-3834
DOI:10.1088/1674-1056/23/8/087504