Which Mask is Preferred for Sub-60 nm Node Imaging?

Saved in:
Bibliographic Details
Published inJapanese Journal of Applied Physics Vol. 46; no. 9S; p. 6124
Main Authors Kim, Sung-Hyuck, Kim, Soon-Ho, Kim, Yong-Hoon, Lee, Jeung-Woo, Woo, Sang-Gyun, Cho, Han-Ku, Oh, Hye-Keun
Format Journal Article
LanguageEnglish
Published 01.09.2007
Online AccessGet full text

Cover

More Information
ISSN:0021-4922
1347-4065
DOI:10.1143/JJAP.46.6124