A novel fabrication of meso-porous silica film by sol-gol of TEOS
A homogeneous crack-free nano- or meso-porous silica films on silicon was fabricated by colloidal silica sol derived by hydrolyzing tetraethyl orthosilicate (TEOS) catalyzing with (C4H9)4N^+OH^- in water medium. The solution with ratio of H2O/TEOS≥15,R4N^+ and glycerol as templates,combining with th...
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| Published in | Journal of Zhejiang University. A. Science Vol. 5; no. 4; pp. 422 - 427 |
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| Main Author | |
| Format | Journal Article |
| Language | English |
| Published |
China
Springer Nature B.V
01.04.2004
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| Subjects | |
| Online Access | Get full text |
| ISSN | 1009-3095 1673-565X 1862-1775 |
| DOI | 10.1631/jzus.2004.0422 |
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| Abstract | A homogeneous crack-free nano- or meso-porous silica films on silicon was fabricated by colloidal silica sol derived by hydrolyzing tetraethyl orthosilicate (TEOS) catalyzing with (C4H9)4N^+OH^- in water medium. The solution with ratio of H2O/TEOS≥15,R4N^+ and glycerol as templates,combining with the hydrolyzed intermediate,controlled the silica aggregating; the templated silica film with heterostructure was developed into homogeneous nano-porous then meso-porous silica films after being annealed from 750℃ to 850℃;the formation mechanism of the porous silica films was discussed;morphologies of the silica films were characterized. The refractive indexes of the porous silica films were 1.256-1.458,the thermal conductivity <0.7 W/m/K.The fabricating procedure and the sequence had not been reported before. |
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| AbstractList | A homogeneous crack-free nano- or meso-porous silica films on silicon was fabricated by colloidal silica sol derived by hydrolyzing tetraethyl orthosilicate (TEOS) catalyzing with (C4H9)4N+OH- in water medium. The solution with ratio of H2O/TEOS> or =15, R4N+ and glycerol as templates, combining with the hydrolyzed intermediate, controlled the silica aggregating; the templated silica film with heterostructure was developed into homogeneous nano-porous then meso-porous silica films after being annealed from 750 degrees C to 850 degrees C; the formation mechanism of the porous silica films was discussed; morphologies of the silica films were characterized. The refractive indexes of the porous silica films were 1.256-1.458, the thermal conductivity < 0.7 W/m/K. The fabricating procedure and the sequence had not been reported before.A homogeneous crack-free nano- or meso-porous silica films on silicon was fabricated by colloidal silica sol derived by hydrolyzing tetraethyl orthosilicate (TEOS) catalyzing with (C4H9)4N+OH- in water medium. The solution with ratio of H2O/TEOS> or =15, R4N+ and glycerol as templates, combining with the hydrolyzed intermediate, controlled the silica aggregating; the templated silica film with heterostructure was developed into homogeneous nano-porous then meso-porous silica films after being annealed from 750 degrees C to 850 degrees C; the formation mechanism of the porous silica films was discussed; morphologies of the silica films were characterized. The refractive indexes of the porous silica films were 1.256-1.458, the thermal conductivity < 0.7 W/m/K. The fabricating procedure and the sequence had not been reported before. A homogeneous crack-free nano- or meso-porous silica films on silicon was fabricated by colloidal silica sol derived by hydrolyzing tetraethyl orthosilicate (TEOS) catalyzing with (C4H9)4N+OH- in water medium. The solution with ratio of H2O/TEOS> or =15, R4N+ and glycerol as templates, combining with the hydrolyzed intermediate, controlled the silica aggregating; the templated silica film with heterostructure was developed into homogeneous nano-porous then meso-porous silica films after being annealed from 750 degrees C to 850 degrees C; the formation mechanism of the porous silica films was discussed; morphologies of the silica films were characterized. The refractive indexes of the porous silica films were 1.256-1.458, the thermal conductivity < 0.7 W/m/K. The fabricating procedure and the sequence had not been reported before. A homogeneous crack-free nano- or meso-porous silica films on silicon was fabricated by colloidal silica sol derived by hydrolyzing tetraethyl orthosilicate (TEOS) catalyzing with (C4H9)4N^+OH^- in water medium. The solution with ratio of H2O/TEOS≥15,R4N^+ and glycerol as templates,combining with the hydrolyzed intermediate,controlled the silica aggregating; the templated silica film with heterostructure was developed into homogeneous nano-porous then meso-porous silica films after being annealed from 750℃ to 850℃;the formation mechanism of the porous silica films was discussed;morphologies of the silica films were characterized. The refractive indexes of the porous silica films were 1.256-1.458,the thermal conductivity <0.7 W/m/K.The fabricating procedure and the sequence had not been reported before. A homogeneous crack-free nano- or meso-porous silica films on silicon was fabricated by colloidal silica sol derived by hydrolyzing tetraethyl orthosilicate (TEOS) catalyzing with (C4H9)4N+OH− in water medium. The solution with ratio of H2O/TEOS≥15, R4N+ and glycerol as templates, combining with the hydrolyzed intermediate, controlled the silica aggregating; the templated silica film with heterostructure was developed into homogeneous nano-porous then meso-porous silica films after being annealed from 750°C to 850°C; the formation mechanism of the porous silica films was discussed; morphologies of the silica films were characterized. The refractive indexes of the porous silica films were 1.256–1.458, the thermal conductivity < 0.7 W/m/K. The fabricating procedure and the sequence had not been reported before. |
| Author | 殷明志 姚熹 张良莹 |
| AuthorAffiliation | ElectronicMaterialsResearchLaboratory,Xi＇anJiaotongUniversity,Xi＇an710049,China |
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| SubjectTerms | Colloids Fabrication Gels Glycerol Heterostructures Microscopy, Electron, Scanning Nanotechnology Particle Size Silanes Silica Silicon dioxide Silicon Dioxide - isolation & purification TEOS Tetraethoxysilane Tetraethyl orthosilicate Thermal conductivity 二氧化硅薄膜 四乙基原硅酸酯 导热性 溶胶-凝胶法 |
| Title | A novel fabrication of meso-porous silica film by sol-gol of TEOS |
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