Effect of Microstructure on Dielectric Breakdown in Amorphous HfO2 Films

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Bibliographic Details
Published in	Microscopy and microanalysis Vol. 20; no. S3; pp. 1984 - 1985
Main Authors	Nandi, S.K., Llewellyn, D. J., Belay, K., Venkatachalam, D.K., Liu, X., Elliman, R.G.
Format	Journal Article
Language	English
Published	New York, USA Cambridge University Press 01.08.2014 Oxford University Press
Subjects	Microscopy and Characterization of Ceramics, Polymers, and Composites Physical Sciences Symposia
Online Access	Get full text

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ISSN:	1431-9276 1435-8115
DOI:	10.1017/S1431927614011659