Laser processed semiconductors for integrated photonic devices -INVITED
We report results of laser processing of amorphous silicon and silicon-germanium semiconductor materials for the production of integrated photonic platforms. As the materials are deposited and processed at low temperatures, they are flexible, low cost, and suitable for multi-layer integration with o...
Saved in:
Published in | EPJ Web of Conferences Vol. 238; p. 1001 |
---|---|
Main Authors | , , , , , , , , |
Format | Journal Article Conference Proceeding |
Language | English |
Published |
Les Ulis
EDP Sciences
2020
|
Subjects | |
Online Access | Get full text |
Cover
Loading…
Summary: | We report results of laser processing of amorphous silicon and silicon-germanium semiconductor materials for the production of integrated photonic platforms. As the materials are deposited and processed at low temperatures, they are flexible, low cost, and suitable for multi-layer integration with other photonic or electronic layers. We demonstrate the formation of waveguides via crystallization of pre-patterned silicon components and functional microstructures through crystallization and compositional tuning of silicon-germanium alloy films. These results open a route for the fabrication of high density, multi-functional integrated optoelectronic chips. |
---|---|
ISSN: | 2100-014X 2101-6275 2100-014X |
DOI: | 10.1051/epjconf/202023801001 |