Plasma-facing surface estimation in the presence of oblique magnetic field

Useful analytical approximation formulas for the sheath electric potential profile in the presence of secondary electron emission in oblique magnetic field is suggested.The potential distributions calculated with the proposed model are in good agreement with the respective simulations perfomed with...

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Bibliographic Details
Published inBulletin of the Russian Academy of Sciences. Physics Vol. 80; no. 2; pp. 120 - 124
Main Authors Borodkina, I. E., Tsvetkov, I. V.
Format Journal Article
LanguageEnglish
Published New York Allerton Press 01.02.2016
Springer Nature B.V
Subjects
Computer simulation
Electron emission
Hadrons
Heavy Ions
Inclination angle
Magnetic fields
Monte Carlo simulation
Nuclear Physics
Physics
Physics and Astronomy
Proceedings of the 22nd International Conference “Ion-Surface Interaction (ISI-2015)”
Potential Distribution
Secondary Electron Emission
Electric Field Potential
Incline Magnetic Field
Floating Potential
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Summary:Useful analytical approximation formulas for the sheath electric potential profile in the presence of secondary electron emission in oblique magnetic field is suggested.The potential distributions calculated with the proposed model are in good agreement with the respective simulations perfomed with a combined PIC and Monte Carlo code ELECTRAN. The influence of the magnetic field inclination angle on the angular and energy distributions of ions incident on plasma-facing components (PFC) and thus on the effective sputtering yield is analyzed.
ISSN:1062-8738
1934-9432
DOI:10.3103/S1062873816020052