Thermal ageing monitoring in Cu Al intermetallic joints through electrical resistance drift: Comparative study of lifetime potential in pure and alloyed copper wires
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Published in | Microelectronics and reliability Vol. 168; p. 115660 |
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Main Authors | , , , , , , |
Format | Journal Article |
Language | English |
Published |
01.05.2025
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Online Access | Get full text |
ISSN | 0026-2714 |
DOI | 10.1016/j.microrel.2025.115660 |
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ArticleNumber | 115660 |
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Author | Mancaleoni, A. Guarino, L. Carluccio, R. Serafini, A. Villa, R. Dellasega, D. Losacco, G. |
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Cites_doi | 10.1016/j.microrel.2007.06.008 10.1108/13565360910923115 10.3390/cryst3030391 10.1109/TCAPT.2003.815121 |
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References | Zhong (10.1016/j.microrel.2025.115660_bb0030) 2009; 26 Servais (10.1016/j.microrel.2025.115660_bb0020) 1991 Mancaleoni (10.1016/j.microrel.2025.115660_bb0005) 2020 Enrici Vaion (10.1016/j.microrel.2025.115660_bb0025) 2016 Kim (10.1016/j.microrel.2025.115660_bb0035) 2003; 26 Chauhan (10.1016/j.microrel.2025.115660_bb0010) 2014 Harman (10.1016/j.microrel.2025.115660_bb0015) 2010 Goh (10.1016/j.microrel.2025.115660_bb0040) 2013; 3 Hang (10.1016/j.microrel.2025.115660_bb0045) 2008; 48 |
References_xml | – volume: 48 start-page: 416 issue: 3 year: 2008 ident: 10.1016/j.microrel.2025.115660_bb0045 article-title: Growth behavior of Cu/Al intermetallic compounds and cracks in copper ball bonds during isothermal aging publication-title: Microelectron. Reliab. doi: 10.1016/j.microrel.2007.06.008 – year: 2020 ident: 10.1016/j.microrel.2025.115660_bb0005 article-title: Copper wire bonding process characterization and simulation – year: 2010 ident: 10.1016/j.microrel.2025.115660_bb0015 – volume: 26 start-page: 10 issue: 1 year: 2009 ident: 10.1016/j.microrel.2025.115660_bb0030 article-title: Wire bonding using copper wire publication-title: Microelectron. Int. doi: 10.1108/13565360910923115 – year: 2014 ident: 10.1016/j.microrel.2025.115660_bb0010 – volume: 3 start-page: 391 issue: 3 year: 2013 ident: 10.1016/j.microrel.2025.115660_bb0040 article-title: Corrosion study and intermetallics formation in gold and copper wire bonding in microelectronics packaging publication-title: Crystals doi: 10.3390/cryst3030391 – volume: 26 start-page: 367 issue: 2 year: 2003 ident: 10.1016/j.microrel.2025.115660_bb0035 article-title: Effects of Cu/Al intermetallic compound (IMC) on copper wire and aluminum pad bondability publication-title: IEEE Trans. Comp. Packag. Technol. doi: 10.1109/TCAPT.2003.815121 – year: 1991 ident: 10.1016/j.microrel.2025.115660_bb0020 article-title: Wire bonding-a closer look – year: 2016 ident: 10.1016/j.microrel.2025.115660_bb0025 article-title: Thin copper wire under extreme HTSL stress duration: crack failure mechanism characterization |
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Title | Thermal ageing monitoring in Cu Al intermetallic joints through electrical resistance drift: Comparative study of lifetime potential in pure and alloyed copper wires |
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