Invitation to the World of the Plasma for Light Sources 4.Light Source for 21st Century 4.1 EUV (Extreme Ultra-Violet) Light Source

• Published in: Journal of Plasma and Fusion Research Vol. 81; no. 12; pp. 1007 - 1009
• Main Author: HOTTA, Kazuaki
• Format: Journal Article
• Language: English
• Published: The Japan Society of Plasma Science and Nuclear Fusion Research 2005
• Subjects: 13.5 nm; debris; debris mitigation; DPP (Discharge Produce Plasma); EUV (Extreme Ultra-Violet); EUV lithography (EUVL); LPP (Laser Produce Plasma); Sn; Xe

EUV lithography with a 13.5nm EUV (Extreme ultra-violet) light source is the strongest candidate of the next generation lithography for LSI. EUV is obtained from a high temperature and high density plasma by DPP (Discharge Produce Plasma) and LPP (Laser Produced Plasma).