Thin Film Optical Waveguide Fabrication Using a CO2 Laser

Film sputtered from SiO2 25mol%-Ta2O5 75mol% target exhibits refractive index decrease up to 4.1×10-2 by CO2 laser irradiation. Some optical circuits, such as mirror, branching circuit, channel waveguide, have been fabricated using this index decrease phenomenon. In the experiment, the maximum defle...

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Bibliographic Details
Published inRēzā kenkyū Vol. 8; no. 4; pp. 651 - 656
Main Authors TERUI, Hiroshi, KOBAYASHI, Morio
Format Journal Article
LanguageEnglish
Published Suita The Laser Society of Japan 1980
Laser Society of Japan
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Summary:Film sputtered from SiO2 25mol%-Ta2O5 75mol% target exhibits refractive index decrease up to 4.1×10-2 by CO2 laser irradiation. Some optical circuits, such as mirror, branching circuit, channel waveguide, have been fabricated using this index decrease phenomenon. In the experiment, the maximum deflecting angle for the mirror is 11.5°. A typical bent channel waveguide with 7.5mm bent radius has a low propagation loss, 1.1 dB/cm at 0.633, μm wavelength. It is shown that the well-known ray equation is applicable to design the optical circuits.
ISSN:0387-0200
1349-6603
DOI:10.2184/lsj.8.651