Improvements in the Quasi-static Capacitance–Voltage Characterization of Semiconductor–Insulator Interface States (Si/SiO 2 )
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Published in | Russian microelectronics Vol. 33; no. 4; pp. 224 - 235 |
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Main Authors | , , , , |
Format | Journal Article |
Language | English |
Published |
01.07.2004
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Online Access | Get full text |
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ISSN: | 1063-7397 |
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DOI: | 10.1023/B:RUMI.0000033828.42915.b1 |