Plasma Etching of Silicon in  SF 6 : Experimental and Reactor Modeling Studies

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Bibliographic Details
Published inJournal of the Electrochemical Society Vol. 137; no. 11; pp. 3633 - 3639
Main Authors Lii, Yeong‐Jyh, Jorné, Jacob, Cadien, Kenneth C., Schoenholtz, Joseph E.
Format Journal Article
LanguageEnglish
Published 01.11.1990
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ISSN:0013-4651
1945-7111
DOI:10.1149/1.2086279