Electrical and Chemical Properties of the HfO[sub 2]/SiO[sub 2]/Si Stack: Impact of HfO[sub 2] Thickness and Thermal Budget

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Bibliographic Details
Published inJournal of the Electrochemical Society Vol. 156; no. 8; p. G120
Main Authors Martinez, E., Leroux, C., Benedetto, N., Gaumer, C., Charbonnier, M., Licitra, C., Guedj, C., Fillot, F., Lhostis, S.
Format Journal Article
LanguageEnglish
Published 2009
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ISSN:0013-4651
DOI:10.1149/1.3153126