Cover Picture: Plasma Process. Polym. 7∕2014

Front Cover: Sub‐micrometers large polyethylene naphtalate and polyimide pillars were fabricated according to a novel bottom‐up approach combining thin polymer structuring (polymer‐demixing) and plasma etching techniques. The figure presents a SEM 30° titled view picture of a nanopatterned polyimide...

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Published inPlasma processes and polymers Vol. 11; no. 7; p. 617
Main Authors Moreno-Couranjou, Maryline, Blondiaux, Nicolas, Pugin, Raphaël, Le Houerou, Vincent, Gauthier, Christian, Kroner, Elmar, Choquet, Patrick
Format Journal Article
LanguageEnglish
Published Blackwell Publishing Ltd 01.07.2014
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Summary:Front Cover: Sub‐micrometers large polyethylene naphtalate and polyimide pillars were fabricated according to a novel bottom‐up approach combining thin polymer structuring (polymer‐demixing) and plasma etching techniques. The figure presents a SEM 30° titled view picture of a nanopatterned polyimide foil with a random pillar distribution. The pillar diameters and heights are around 430 ± 80 nm and 1600 nm, respectively. Further details can be found in the article by Maryline Moreno‐Couranjou et. al. on page 647.
Bibliography:ark:/67375/WNG-WBZ6NF83-B
istex:6B193E38AF2F5162A497B11A3A72D8D7B9B7C22E
ArticleID:PPAP201470026
ISSN:1612-8850
1612-8869
DOI:10.1002/ppap.201470026