Exploring metalorganic chemical vapor deposition of Si-alloyed Al 2 O 3 dielectrics using disilane

Saved in:
Bibliographic Details
Published inJournal of crystal growth Vol. 464; pp. 54 - 58
Main Authors Chan, Silvia H., Keller, Stacia, Koksaldi, Onur S., Gupta, Chirag, DenBaars, Steven P., Mishra, Umesh K.
Format Journal Article
LanguageEnglish
Japanese
Published 01.04.2017
Online AccessGet full text

Cover

More Information
ISSN:0022-0248
DOI:10.1016/j.jcrysgro.2016.11.096