Fabrication of Pb(Zr, Ti)O 3 Microscopic Capacitors by Electron Beam Lithography

An epitaxial microscopic capacitor array of Pb(Zr, Ti)O 3 /SrRuO 3 with 0.5-to 2-µ m squares was fabricated by electron-beam lithography and Ar-ion etching on a SrTiO 3 (001) substrate. Atomic force microscopic observation revealed that line-and-spacing larger than 1 µ m assures adequate separation...

Full description

Saved in:
Bibliographic Details
Published inJapanese Journal of Applied Physics Vol. 36; no. 8R; p. 5219
Main Authors Hiratani, Masahiko, Okazaki, Choichiro, Hasegawa, Haruhiro, Sugii, Nobuyuki, Tarutani, Yoshinobu, Takagi, Kazumasa
Format Journal Article
LanguageEnglish
Published 01.08.1997
Online AccessGet full text

Cover

Loading…
More Information
Summary:An epitaxial microscopic capacitor array of Pb(Zr, Ti)O 3 /SrRuO 3 with 0.5-to 2-µ m squares was fabricated by electron-beam lithography and Ar-ion etching on a SrTiO 3 (001) substrate. Atomic force microscopic observation revealed that line-and-spacing larger than 1 µ m assures adequate separation between capacitors. A thin barrier is formed on the terrace edge of the capacitors due to re-deposition of Ar-ion etched oxide.
ISSN:0021-4922
1347-4065
DOI:10.1143/JJAP.36.5219