Fabrication of Pb(Zr, Ti)O 3 Microscopic Capacitors by Electron Beam Lithography
An epitaxial microscopic capacitor array of Pb(Zr, Ti)O 3 /SrRuO 3 with 0.5-to 2-µ m squares was fabricated by electron-beam lithography and Ar-ion etching on a SrTiO 3 (001) substrate. Atomic force microscopic observation revealed that line-and-spacing larger than 1 µ m assures adequate separation...
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Published in | Japanese Journal of Applied Physics Vol. 36; no. 8R; p. 5219 |
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Main Authors | , , , , , |
Format | Journal Article |
Language | English |
Published |
01.08.1997
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Online Access | Get full text |
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Summary: | An epitaxial microscopic capacitor array of Pb(Zr, Ti)O
3
/SrRuO
3
with 0.5-to 2-µ m squares was fabricated by electron-beam lithography and Ar-ion etching on a SrTiO
3
(001) substrate. Atomic force microscopic observation revealed that line-and-spacing larger than 1 µ m assures adequate separation between capacitors. A thin barrier is formed on the terrace edge of the capacitors due to re-deposition of Ar-ion etched oxide. |
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ISSN: | 0021-4922 1347-4065 |
DOI: | 10.1143/JJAP.36.5219 |