Preparation of SiO x N y films by reactive KrF laser ablation

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Bibliographic Details
Published inApplied surface science Vol. 96-98; pp. 764 - 768
Main Authors Maruyama, Kazunori, Aoki, Yasushi, Matsumoto, Masunori, Hiroshima, Yasushi, Ohta, Hiroshi
Format Journal Article
LanguageEnglish
Published 01.04.1996
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ISSN:0169-4332
DOI:10.1016/0169-4332(95)00551-X