Thick silver electrodeposition on copper substrate for 109Cd production

Silver electrodeposition on copper substrate was investigated for production of 109 Ca. The electrodeposition experiments were carried out by the alkaline plating baths. The optimum conditions of the electrodeposition of silver were: 4.1 g/1 silver, pH 10–12, DC current density of ca. 4.27 mA·cm −2...

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Bibliographic Details
Published inJournal of radioanalytical and nuclear chemistry Vol. 277; no. 3; pp. 645 - 650
Main Authors Mirzaee, M., Sadeghi, M., Gholamzadeh, Z., Lahouti, Shapour
Format Journal Article
LanguageEnglish
Published Dordrecht Springer Netherlands 01.09.2008
Subjects
Chemistry
Chemistry and Materials Science
Diagnostic Radiology
Hadrons
Heavy Ions
Inorganic Chemistry
Nuclear Chemistry
Nuclear Physics
Physical Chemistry
Copper Substrate
Current Efficiency
Free Cyanide
Silver Layer
Radiation Isotope
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Summary:Silver electrodeposition on copper substrate was investigated for production of 109 Ca. The electrodeposition experiments were carried out by the alkaline plating baths. The optimum conditions of the electrodeposition of silver were: 4.1 g/1 silver, pH 10–12, DC current density of ca. 4.27 mA·cm −2 at 40–50 °C temperature with 100% current efficiency.
Bibliography:ObjectType-Article-2
SourceType-Scholarly Journals-1
ObjectType-Feature-1
content type line 23
ISSN:0236-5731
1588-2780
DOI:10.1007/s10967-007-7161-8