Ce/sup 3+/:LiCaAlF/sub 6/ crystal for high-gain or high-peak-power amplification of ultraviolet femtosecond pulses and new potential ultraviolet gain medium: Ce/sup 3+/:LiSr/sub 0.8/Ca/sub 0.2/AlF/sub 6

To develop high-peak-power ultrashort pulse laser systems in the ultraviolet region, a large Ce/sup 3+/:LiCaAlF/sub 6/ (Ce:LiCAF) crystal, a tunable ultraviolet laser medium with large saturation fluence and broad gain spectrum width, was grown successfully with a diameter of more than 70 mm. To dem...

Full description

Saved in:
Bibliographic Details
Published inIEEE journal of selected topics in quantum electronics Vol. 7; no. 4; pp. 542 - 550
Main Authors Liu, Z., Kozeki, T., Suzuki, Y., Sarukura, N., Shimamura, K., Fukuda, T., Hirano, M., Hosono, H.
Format Journal Article
LanguageEnglish
Published IEEE 01.07.2001
Subjects
Online AccessGet full text

Cover

Loading…
More Information
Summary:To develop high-peak-power ultrashort pulse laser systems in the ultraviolet region, a large Ce/sup 3+/:LiCaAlF/sub 6/ (Ce:LiCAF) crystal, a tunable ultraviolet laser medium with large saturation fluence and broad gain spectrum width, was grown successfully with a diameter of more than 70 mm. To demonstrate high small signal gain, a four-pass confocal amplifier with 60 dB gain and 54 /spl mu/J output energy was constructed. Chirped pulse amplification (CPA) in the ultraviolet region was demonstrated using Ce:LiCAF for higher energy extraction. A modified bow-tie-style four-pass amplifier pumped by 100-mJ 266-nm 10-Hz pulses from a Q-switched Nd:YAG laser had 370-times gain and delivered 6-mJ 290-nm pulses. After dispersion compensation, the output pulses can be compressed down to 115 fs. This is the first ultraviolet, all-solid-state high-peak-power CPA laser system using ultraviolet gain media, and this demonstration shows further scalability of the Ce:LiCAF CPA system. Additionally, a new gain medium, Ce/sup 3+/:LiSr/sub 0.8/Ca/sub 0.2/AlF/sub 6/, with longer fluorescence lifetime and sufficient gain spectrum width over 18 nm was grown to upgrade this system as a candidate for a final power amplifier gain module.
ISSN:1077-260X
1558-4542
DOI:10.1109/2944.974225