Effect of annealing temperature on the microstructure and photoluminescence of low resistivity Si/SiN/TaN thin films using magnetron sputtering
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Published in | Thin solid films Vol. 520; no. 5; pp. 1460 - 1463 |
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Main Authors | , , , , |
Format | Journal Article |
Language | English |
Published |
30.12.2011
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Online Access | Get full text |
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Author | Lee, C.T. Chung, C.K. Chang, N.W. Liao, M.W. Chen, T.S. |
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Cites_doi | 10.1088/0957-4484/20/30/305704 10.1016/S1293-2558(02)01369-9 10.1063/1.2740335 10.1038/353335a0 10.1063/1.2158022 10.1016/j.jlumin.2008.11.003 10.1063/1.359062 10.1063/1.104512 10.1063/1.2814053 10.1063/1.371102 10.1063/1.3148248 10.1016/j.scriptamat.2007.06.011 10.1063/1.2399393 10.1016/j.jcrysgro.2008.05.018 10.1088/0957-4484/20/41/415608 10.1016/S0040-6090(02)00342-5 10.1063/1.2711196 10.1063/1.1872211 10.1063/1.2150586 10.1088/0957-4484/17/18/020 10.1063/1.3501133 10.1016/S0040-6090(96)88640-8 |
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