Effect of annealing temperature on the microstructure and photoluminescence of low resistivity Si/SiN/TaN thin films using magnetron sputtering

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Published inThin solid films Vol. 520; no. 5; pp. 1460 - 1463
Main Authors Chung, C.K., Chen, T.S., Chang, N.W., Liao, M.W., Lee, C.T.
Format Journal Article
LanguageEnglish
Published 30.12.2011
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Author Lee, C.T.
Chung, C.K.
Chang, N.W.
Liao, M.W.
Chen, T.S.
Author_xml – sequence: 1
  givenname: C.K.
  surname: Chung
  fullname: Chung, C.K.
– sequence: 2
  givenname: T.S.
  surname: Chen
  fullname: Chen, T.S.
– sequence: 3
  givenname: N.W.
  surname: Chang
  fullname: Chang, N.W.
– sequence: 4
  givenname: M.W.
  surname: Liao
  fullname: Liao, M.W.
– sequence: 5
  givenname: C.T.
  surname: Lee
  fullname: Lee, C.T.
BookMark eNotkE1uwjAUhL2gUoH2AN35AgnPSXDCskL0R0J0AV1bxnkGo8SObKcVp-iVm9CuRprFN5pvRibWWSTkiUHKgPHFJY1BpxkwlkKZAmcTMgUoIOGwgnsyC-ECACzL8in52WiNKlKnqbQWZWPsiUZsO_Qy9h6pszSekbZGeRei79Wtlbam3dlF1_StsRgUWoUjpHHf1GMwIZovE690bxZ7s1sc5G7AGEu1adpA-zDOtPJkMfphIXR9jOiH8oHcadkEfPzPOfl82RzWb8n24_V9_bxNFOMQk2NZSlnwslqiWuaAXHJea1mzVTH-QlkjMJAZK7Q6omZKlbUuq7xaYVVwqPI5YX_c8VbwqEXnTSv9VTAQo0VxEYNFMVoUUIrBYv4LwtpvEw
CitedBy_id crossref_primary_10_7498_aps_62_126801
crossref_primary_10_1088_1612_2011_12_9_096003
crossref_primary_10_4028_www_scientific_net_SSP_310_81
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ContentType Journal Article
DBID AAYXX
CITATION
DOI 10.1016/j.tsf.2011.07.061
DatabaseName CrossRef
DatabaseTitle CrossRef
DeliveryMethod fulltext_linktorsrc
Discipline Engineering
Physics
EndPage 1463
ExternalDocumentID 10_1016_j_tsf_2011_07_061
GroupedDBID --K
--M
-~X
.DC
.~1
0R~
123
1B1
1RT
1~.
1~5
29Q
4.4
457
4G.
5VS
6TJ
7-5
71M
8P~
9JN
AABNK
AABXZ
AACTN
AAEDT
AAEDW
AAEPC
AAIKJ
AAKOC
AALRI
AAOAW
AAQFI
AAQXK
AAXKI
AAXUO
AAYJJ
AAYXX
ABFNM
ABFRF
ABJNI
ABMAC
ABNEU
ABXDB
ABXRA
ACBEA
ACDAQ
ACFVG
ACGFO
ACGFS
ACNNM
ACRLP
ADBBV
ADEZE
ADMUD
AEBSH
AEFWE
AEKER
AENEX
AEZYN
AFFNX
AFJKZ
AFKWA
AFRZQ
AFTJW
AGHFR
AGUBO
AGYEJ
AHHHB
AIEXJ
AIKHN
AITUG
AIVDX
AJOXV
AKRWK
ALMA_UNASSIGNED_HOLDINGS
AMFUW
AMRAJ
ASPBG
AVWKF
AXJTR
AZFZN
BBWZM
BKOJK
BLXMC
CITATION
CS3
DU5
EBS
EFJIC
EJD
EO8
EO9
EP2
EP3
F5P
FDB
FEDTE
FGOYB
FIRID
FNPLU
FYGXN
G-2
G-Q
G8K
GBLVA
HMV
HVGLF
HX~
HZ~
IHE
J1W
KOM
M24
M38
M41
MAGPM
MO0
N9A
NDZJH
O-L
O9-
OAUVE
OGIMB
OZT
P-8
P-9
P2P
PC.
Q38
R2-
RIG
RNS
ROL
RPZ
SDF
SDG
SDP
SES
SEW
SMS
SPC
SPCBC
SPD
SPG
SSM
SSQ
SSZ
T5K
TWZ
VOH
WH7
WUQ
ZMT
~G-
ID FETCH-LOGICAL-c160t-b77aa46785ec530e6a66dfad1941223eade010a214fcbef1cc7df78389e846083
ISSN 0040-6090
IngestDate Thu Sep 26 16:23:09 EDT 2024
IsPeerReviewed true
IsScholarly true
Issue 5
Language English
LinkModel OpenURL
MergedId FETCHMERGED-LOGICAL-c160t-b77aa46785ec530e6a66dfad1941223eade010a214fcbef1cc7df78389e846083
PageCount 4
ParticipantIDs crossref_primary_10_1016_j_tsf_2011_07_061
PublicationCentury 2000
PublicationDate 2011-12-30
PublicationDateYYYYMMDD 2011-12-30
PublicationDate_xml – month: 12
  year: 2011
  text: 2011-12-30
  day: 30
PublicationDecade 2010
PublicationTitle Thin solid films
PublicationYear 2011
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SSID ssj0001223
Score 2.081264
SourceID crossref
SourceType Aggregation Database
StartPage 1460
Title Effect of annealing temperature on the microstructure and photoluminescence of low resistivity Si/SiN/TaN thin films using magnetron sputtering
Volume 520
hasFullText 1
inHoldings 1
isFullTextHit
isPrint
link http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwnV1Lb9QwELZWWyHBAZUCAkqRD5xYJXUezuNYVa0qlu6B3aq9RY7tQFbdZKVNhdQ_wU_grzLjPNYtRaJcot2RYyWeLzPj8fgzIR8TcEoBj3InTETohJIrJw3yxElEDN5T5YEvMKF_PovOLsLPV_xqNPplVS3dNLkrbx_cV_I_WgUZ6BV3yT5Cs0OnIIDfoF-4gobh-k867qiHcSkfzKUwO8uRa6ojSu4WAiYrLLpriWL75YL197pBu4RF79J83NDJdf1jArNv_OrNiRJzfLR5OUOCETGDrsoKeZxWm8mNyTCsxLdKYyp9slmb8657N7jsIQg3wAiUqr1tW0rQWZhjd-puha0BXLhzS9Zls2fu5SD8UgqT3j3vZWpIwiIzIrPtMG46YO1Bob0d5j6zAMctqwrWnFkeGv4GD1r_NhGxdJtNT84au6zler_LtH3PAw51iX3J2zKDLjLsImNxxnB6vePHKedjsnM0_Xo5HZy95_tDYSa-UL9wbkoI7z2HFfpYMcxilzzvJh_0qEXSCzLS1R55ZlFS7pEnpiRYbl6Sny26aF3QAV3UQhetKwroonfRBW0V_QNd2Amgi1roovPyELB1CMiiiCxqIEINsuiALLpF1itycXqyOD5zuuM7HOlFrHHyOBYC_HDCteQB05GIIlUI5aUhjhpW6jOPCd8LC5nrwpMyVkWcQAStISiGqcFrMq7qSr8hNBJB4Mu0gOk-h9ae4BBi5CpJcV-50sFb8qkf2WzdsrRkf9Xlu8c03idPtwB-T8YwmvoAwtAm_9BB4TcvR4wi
link.rule.ids 315,786,790,27955,27956
linkProvider Library Specific Holdings
openUrl ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fsummon.serialssolutions.com&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Ajournal&rft.genre=article&rft.atitle=Effect+of+annealing+temperature+on+the+microstructure+and+photoluminescence+of+low+resistivity+Si%2FSiN%2FTaN+thin+films+using+magnetron+sputtering&rft.jtitle=Thin+solid+films&rft.au=Chung%2C+C.K.&rft.au=Chen%2C+T.S.&rft.au=Chang%2C+N.W.&rft.au=Liao%2C+M.W.&rft.date=2011-12-30&rft.issn=0040-6090&rft.volume=520&rft.issue=5&rft.spage=1460&rft.epage=1463&rft_id=info:doi/10.1016%2Fj.tsf.2011.07.061&rft.externalDBID=n%2Fa&rft.externalDocID=10_1016_j_tsf_2011_07_061
thumbnail_l http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/lc.gif&issn=0040-6090&client=summon
thumbnail_m http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/mc.gif&issn=0040-6090&client=summon
thumbnail_s http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/sc.gif&issn=0040-6090&client=summon