Influence of the deposition parameters on the chemical composition of reactively rf sputtered TiO2 on Si

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Bibliographic Details
Published inApplied surface science Vol. 115; no. 2; pp. 128 - 134
Main Authors ALEXANDROV, P, KOPRINAROVA, J, TODOROV, D
Format Journal Article
LanguageEnglish
Published Amsterdam Elsevier Science 01.06.1997
Subjects
Composition and phase identification
Condensed matter: structure, mechanical and thermal properties
Exact sciences and technology
Physics
Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)
Thin film structure and morphology
Thin films
Crystal growth
Interface structure
Titanium oxides
Magnetrons
Cathode sputtering
Inorganic compounds
Transition element compounds
Chemical composition
Experimental study
Fabrication property relation
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ISSN:0169-4332
1873-5584
DOI:10.1016/S0169-4332(97)80195-X