Determination of interface states in metal(Ag,TiN,W)−Hf:Ta2O5/SiO N −Si structures by different compact methods

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Bibliographic Details
Published inMaterials science in semiconductor processing Vol. 39; pp. 308 - 317
Main Author Novkovski, N.
Format Journal Article
LanguageEnglish
Published 01.11.2015
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ISSN:1369-8001
DOI:10.1016/j.mssp.2015.05.028