S9000X - Next Generation of Ultra-High Resolution SEM for Enhanced Analysis and Xe Plasma FIB for Ultra-Fast and Gentle Sputtering

Saved in:
Bibliographic Details
Published inMicroscopy and microanalysis Vol. 24; no. S1; pp. 1116 - 1117
Main Authors Havelka, Miloslav, Jiruse, Jaroslav, Hrncif, Tomas, Jan Polster, Vana, Rostislav, Zachej, Samuel
Format Journal Article
LanguageEnglish
Published New York, USA Cambridge University Press 01.08.2018
Oxford University Press
Subjects
Analytical and Instrumentation Science Symposia
Vendor Symposium
Online AccessGet full text

Cover

More Information
ISSN:1431-9276
1435-8115
DOI:10.1017/S1431927618006062