Effect of low-frequency power on etching of SiCOH low-k films in CHF3 13.56MHz/2MHz dual-frequency capacitively coupled plasma

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Bibliographic Details
Published inMicroelectronic engineering Vol. 86; no. 3; pp. 421 - 424
Main Authors Ye, Chao, Xu, Yijun, Huang, Xiaojiang, Xing, Zhenyu, Yuan, Jing, Ning, Zhaoyuan
Format Journal Article
LanguageEnglish
Japanese
Published 01.03.2009
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ISSN:0167-9317
DOI:10.1016/j.mee.2008.12.037