Effect of N2-annealing on n-type Si metal–oxide–semiconductor capacitors by using liquid-phase deposition SiO2

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Bibliographic Details
Published inMicro & nano letters Vol. 6; no. 11; p. 944
Main Authors Yang, Gwo-Huei, Chang, Wen-Tse, Hwang, Jun-Dar, Lin, Jun-Hung, Chen, Yu-Hung
Format Journal Article
LanguageEnglish
Published 01.11.2011
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ISSN:1750-0443
1750-0443
DOI:10.1049/mnl.2011.0472