Shape Control of Trenched 4H-SiC C-Face by Thermal Chlorine Etching

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Bibliographic Details
Published inJapanese Journal of Applied Physics Vol. 51; no. 5R; p. 51201
Main Authors Koketsu, Hidenori, Hatayama, Tomoaki, Yano, Hiroshi, Fuyuki, Takashi
Format Journal Article
LanguageEnglish
Japanese
Published 01.05.2012
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ISSN:0021-4922
1347-4065
DOI:10.7567/JJAP.51.051201