Oxidation Resistance of Ti–Si–N and Ti–Al–Si–N Films Deposited by Reactive Sputtering Using Alloy Targets

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Bibliographic Details
Published in	Japanese Journal of Applied Physics Vol. 50; no. 7R; p. 75802
Main Authors	Takahashi, Kousuke, Oka, Nobuto, Yamaguchi, Maho, Seino, Yutaka, Hattori, Koichiro, Nakamura, Shin-ichi, Sato, Yasushi, Shigesato, Yuzo
Format	Journal Article
Language	English Japanese
Published	01.07.2011
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ISSN:	0021-4922 1347-4065
DOI:	10.7567/JJAP.50.075802