Crystallization Behavior of Sputtered Amorphous Silicon Films by Blue-Multi-Laser-Diode Annealing
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Published in | Japanese Journal of Applied Physics Vol. 50; no. 2R; p. 21402 |
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Main Authors | , , , , , , , , |
Format | Journal Article |
Language | English |
Published |
01.02.2011
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Online Access | Get full text |
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ISSN: | 0021-4922 1347-4065 |
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DOI: | 10.7567/JJAP.50.021402 |