Maskless Lithographic Fine Patterning on Deeply Etched or Slanted Surfaces, and Grayscale Lithography, Using Newly Developed Digital Mirror Device Lithography Equipment

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Bibliographic Details
Published inJapanese Journal of Applied Physics Vol. 51; no. 6S; p. 6
Main Authors Iwasaki, Wataru, Takeshita, Toshihiro, Peng, Yao, Ogino, Hiroaki, Shibata, Hiromasa, Kudo, Yuji, Maeda, Ryutaro, Sawada, Renshi
Format Journal Article
LanguageEnglish
Japanese
Published 01.06.2012
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ISSN:0021-4922
1347-4065
DOI:10.7567/JJAP.51.06FB05