Parametric Study on the Physical Action of Steam–Water Mixture Jet: Removal of Photoresist Film from Silicon Wafer Surfaces

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Bibliographic Details
Published inJapanese Journal of Applied Physics Vol. 51; no. 6R; p. 67101
Main Authors Mashiko, Takashi, Sanada, Toshiyuki, Nishiyama, Itsuo, Horibe, Hideo
Format Journal Article
LanguageEnglish
Published 01.06.2012
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ISSN:0021-4922
1347-4065
DOI:10.7567/JJAP.51.067101