Influence of sputtering gas pressure on the LiCoO2 thin film cathode post-annealed at 400 °C
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Published in | The Korean journal of chemical engineering Vol. 23; no. 5; pp. 832 - 837 |
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Main Authors | , , , , , , , |
Format | Journal Article |
Language | English |
Published |
01.09.2006
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Online Access | Get full text |
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ISSN: | 0256-1115 1975-7220 |
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DOI: | 10.1007/BF02705936 |