Impact of Process-Effect Correction Strategies on Variability of Critical Dimension and Electrical Characteristics in Extreme Ultraviolet Lithography

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Bibliographic Details
Published inJapanese Journal of Applied Physics Vol. 50; no. 6S; p. 6
Main Authors Ng, Philip C. W., Chien, Sheng-Wei, Chang, Bo-Sen, Tsai, Kuen-Yu, Lu, Yi-Chang, Li, Jia-Han, Chen, Alek C.
Format Journal Article
LanguageEnglish
Published 01.06.2011
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ISSN:0021-4922
1347-4065
DOI:10.7567/JJAP.50.06GB07