Rapid fabrication and corrosion behavior of 3D-porous Cu-Al-Si compounds via low-energy self-exothermic reaction

In this study, porous Cu-Al-Si intermetallic compounds with three-dimensional structures were rapidly prepared by a novel self-exothermic reaction. By this method, Si was successfully solid-solved into CuAl intermetallic compounds and achieved better fusion with them. The effects of Si addition on t...

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Bibliographic Details
Published inJournal of alloys and compounds Vol. 1010; p. 177198
Main Authors Pang, Zixuan, Shang, Zhichao, Xu, Xuewei, Guo, Weijia, Tang, Bowen, Akhtar, Farid, Zhang, Baojing, Wang, Jianzhong, Cai, Xiaoping, Feng, Peizhong
Format Journal Article
LanguageEnglish
Published Elsevier B.V 2025
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Summary:In this study, porous Cu-Al-Si intermetallic compounds with three-dimensional structures were rapidly prepared by a novel self-exothermic reaction. By this method, Si was successfully solid-solved into CuAl intermetallic compounds and achieved better fusion with them. The effects of Si addition on their oxidation resistance and corrosion resistance were compared. The findings indicate that the minimum weight gain of the Cu-Al-Si product is only 1.48 % after oxidation at 800 °C for 288 h. Si facilitates the creation of a continuous Al2O3 protective layer on the surface of the porous Cu-Al-Si intermetallics skeleton, thereby preserving its internal structure while significantly enhancing its oxidation resistance. The incorporation of Si to Cu-Al intermetallics enhances the stability of the passivation film on the material's surface, increases the resistance of the passivation film, and effectively restricts the electrochemical reaction between the material and the corrosive medium. •Porous Cu-Al-Si intermetallics were prepared by thermal explosion reaction.•Adding Si reduces the heat release and limits the extent of TE reaction.•The mass gain of the Cu-Al-Si intermetallics was only 1.48 % after oxidation.•The incorporation of Si improves sulphuric acid corrosion resistance.
ISSN:0925-8388
1873-4669
DOI:10.1016/j.jallcom.2024.177198