Plasma‐Enhanced Chemical Vapor Deposition of Silicon Dioxide Deposited at Low Temperatures

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Bibliographic Details
Published inJournal of the Electrochemical Society Vol. 142; no. 6; pp. 2067 - 2071
Main Authors Ceiler, M. F., Kohl, P. A., Bidstrup, S. A.
Format Journal Article
LanguageEnglish
Japanese
Published 01.06.1995
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ISSN:0013-4651
1945-7111
DOI:10.1149/1.2044242