Ultrahigh Vacuum Chemical Vapor Deposition of Doped and Intrinsic Si[sub 1−x]C[sub x] Epitaxy from Disilane, Trimethylsilane, and Phosphine

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Bibliographic Details
Published in	Journal of the Electrochemical Society Vol. 157; no. 6; p. H699
Main Authors	Alptekin, Emre, Ozturk, Mehmet C.
Format	Journal Article
Language	English Japanese
Published	2010
Online Access	Get full text

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ISSN:	0013-4651
DOI:	10.1149/1.3414167