Microprobe metrology for direct sheet resistance and mobility characterization

The M4PP measurement technique has gained increased interest from the semiconductor industry for direct sheet resistance measurements on ultra thin layers and small structures/pads. Several fully automatic microRSP probing tools are today in use for in-line sheet resistance measurements on blanket a...

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Bibliographic Details
Published in2012 12th International Workshop on Junction Technology pp. 100 - 105
Main Authors Nielsen, P. F., Petersen, D. H., Rong Lin, Jensen, A., Henrichsen, H. H., Gammelgaard, L., Kjaer, D., Hansen, O.
Format Conference Proceeding
LanguageEnglish
Published IEEE 01.05.2012
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Summary:The M4PP measurement technique has gained increased interest from the semiconductor industry for direct sheet resistance measurements on ultra thin layers and small structures/pads. Several fully automatic microRSP probing tools are today in use for in-line sheet resistance measurements on blanket and patterned wafers. Using the next generation of microRSP probing tools it will be possible to perform both sheet resistance, mobility and active carrier density measurements using the collinear M4PP. In this article we demonstrate the various techniques necessary to perform high quality measurements using the M4PP and present the technical progress made during the last few years.
ISBN:1467312584
9781467312585
DOI:10.1109/IWJT.2012.6212819