Etchless Fabrication of High‐Quality Refractory Titanium Nitride Nanostructures

The back‐cover image illustrates the removal of the colloidal nanosphere lithography mask (in the right side of the image) revealing the well‐defined, high crystalline quality triangular nano‐islands of titanium nitride, an emerging nanomaterial for plasmonic applications, fabricated by reactive mag...

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Published inphysica status solidi (b) Vol. 258; no. 7
Main Authors Panos, Stavros, Tselekidou, Despina, Kassavetis, Spyros, Fekas, Ilias, Arvanitidis, John, Christofilos, Dimitris, Karfaridis, Dimitrios, Dellis, Spilios, Logothetidis, Stergios, Patsalas, Panos
Format Journal Article
LanguageEnglish
Published 01.07.2021
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Summary:The back‐cover image illustrates the removal of the colloidal nanosphere lithography mask (in the right side of the image) revealing the well‐defined, high crystalline quality triangular nano‐islands of titanium nitride, an emerging nanomaterial for plasmonic applications, fabricated by reactive magnetron sputtering. For further information see article number 2000573 by Spyros Kassavetis, Panos Patsalas and co‐workers, which is also part of the virtual issue “60 years of pss”. (Artistic illustration: Stelios Karamanidis).
ISSN:0370-1972
1521-3951
DOI:10.1002/pssb.202170033