Erratum: "Modeling the temporal evolution and stability of thin evaporating films for wafer surface processing" [J. Chem. Phys. 157, 084706 (2022)]

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Bibliographic Details
Published inThe Journal of chemical physics Vol. 161; no. 13
Main Authors Huber, Max, Hu, Xiao, Zienert, Andreas, Schuster, Jörg, Schulz, Stefan E
Format Journal Article
LanguageEnglish
Published United States 07.10.2024
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ISSN:1089-7690
DOI:10.1063/5.0237668