Deposition of chromium aluminum nitride coatings by arc ion plating

• Published in: Transactions of Nonferrous Metals Society of China Vol. 17; no. A02; pp. 780 - 784
• Main Author: 张淑娟 李明升 冯长杰 刘庭芝 多树旺
• Format: Journal Article
• Language: English
• Published: 01.11.2007
• Subjects: 电弧离子电镀法; 电沉积; 铬铝氮涂层
• ISSN: 1003-6326

Cr-Al-N ternary coatings were deposited by arc ion plating method using isolated Cr target and Al target. The influence of AlN content on the phase change was studied by synthesizing Cr1-xAlxN coatings with different x values. The effects of substrate negative bias on the surface morphology, deposition rate and phase structure were investigated. As the aluminum content increases, the structure of （Cr1-xAlx）N changes from Bl（NaCl） phase to B4（wurtzite） phase. The critical content of A1N solubilized in B 1 （NaCl） lattice is close to 0.7. With the increasing pulse negative bias, the deposition rate decreases constantly, the droplet contamination is more serious, the ion-etching effect on coating surface is more obvious, and the change of preferred orientation and the shift of XRD peak take place.